Our group has sufficient equipment for basic experiments from fabrication of mesoscopic devices to their measuement at low temperatures.
Part of the instruments are shared with Mizugaki group.
Liquid He and N2 are supplied at the Cryogenic Center in the basement of the same building where we have a huge He liquefier.

Cryogenics
- Laboratory-made compact dilution refrigerator with the base temperature of 80 mK and a 4 T superconducting magnet 
-Compact dilution refrigerator with the base temperature of 80 mK and a 4 T superconducting magnet 
- Dilution refrigerator: Oxford 75TLE with a 8T superconducting magnet
- Superconducting magnet: Desert Cryogenics 8T
- DC SQUID system: Magnicon XXF-1 (1)

Vacuum Process Instruments
- 2 kW E-gun evaporator with turbo pump (1)
- 2 kW E-gun evaporator with low-temperature ALD system (1)
- 6 kW E-gun evaporator with turbo pump (under construction)
- Oil-diffusion-pump-based vacuum evaporator (1)
- Turbo-pump-based vacuum evaporator with inductively coupled plasma generator (1)
- Inductively coupled plasma treatment chamber (1)
- Capacitively couopled plasma treatment chamber (1)
- He leak detector: Balzlers (1), Anerva (1)

General Instrumentation
- Temperature controller: LakeShore Model 370 (2)
- Resistance Bridge: PICOWATT AVS-47 (1)
- Digital multimeters: HP 3458A (2), Keithley 2000 (10), Agilent 34401A (4)
- DC voltage source: Keithley 213 (4)
- DC voltage/current source: Advantest R6144 (3)
- Digital oscilloscope: Agilent DSO6104A(1), HP 54510A(1), Tektronix (1)
- Current preamprifier: Stanford Research Systems SR570 (6)
- Analog lock-in amplifier: NF LI-575 (2), EG&G 124A (3)
- Digital lock-in amplifier: NF 5610B (2)
- Dynamic signal analyzer Stanford Research Systems SR785 (1)
- Impedance analyzer: HP (1)

RF Instruments
- Network analyzer: Agilent 8753ES [30 kHz- 3 GHz] (1)
- Spectrum analyzer: Advantest R3273 [26 GHz] (1)
- Function generator: Agilent 33250A [80 MHz] (1)
- LNA: Agilent 310 (1)
- Cryogenic wideband LNA: Low Noise Factory (2)

Process Instruments
- Manual wedge wire bonder: Westbond 7476D (1)
- Wafer scriber: Kyowa-Riken K-604S100 (1)
- Spin coater: Mikasa 1H-D7 (1)
- Optical Microscope: Nikon LV150-TT2-DIC-B (1)
- Optical Microscope: Olympus BHT-3B-MP (1)

Nanofabrication
We use photo- and E-beam lithography equipments in the SVBL of UEC
- Mask aligner (photo lithography)
- EBL: Tokyo Technology (JEOL SEM based)
- FE-SEM: JEOL